Published on December 19, 2025

Key Updates in version 2025.2.2:

Key Updates in version 2025.2.2:

New features since release 2025.2.0

Author: Herbert Heppner, Team Lead Software Technology | Publish date 18.12.2025

Patch Artist

Improved performance for curve and surface propagation

The extraction extension feature in ARTIST STUDIO is a highly efficient tool for quickly selecting relevant entities of a part surface as part of the surface or curve extraction creation. Users start by selecting one or multiple edges or faces, and with a single click, all connected elements are automatically added to the selection. By defining a tolerance angle, the propagation can be limited to smooth surface regions, ensuring accurate selection of continuous geometries.

With the latest software update, the performance of curve and surface propagation has been improved by several orders of magnitude. The acceleration is particularly noticeable on CAD models containing fine surface details – such as engraved text – that previously slowed down the selection process. These operations now run virtually instantaneously, significantly improving workflow efficiency for complex parts.

Motion Artist

Consistent handling of movement optimization

We took a closer look at the user experience for deposit optimization (previously movement optimization). Deposit optimization is a vital necessity for systems that use a multi-axis tool manipulator (robot), but it is not needed for cells with static tools or tools on a simple rotational axis. This is now more obvious from the user interface and enables users to focus on relevant tasks. In addition, we revised the naming of our functions: movement optimization has been renamed to deposit optimization (the adjustment of a deposit frame to improve reachability) to make it more easily distinguishably from sequence optimization (the order in which patches are placed). Scripting functions were updated to reflect this change as well, while keeping compatibility with legacy scripting files.

Figure 1: Deposition optimization
 

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